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Everything about Multiple patterning
Technique used to increase the number of structures a microchip may contain
Multiple patterning is a class of technologies for manufacturing integrated circuits (ICs), developed for photolithography to enhance the feature density. It is expected to be necessary for the 10 nm and 7 nm node semiconductor processes and beyond. The premise is that a single lithographic exposure may not be enough to provide sufficient resolution. Hence additional exposures would be needed, or else positioning patterns using etched feature sidewalls would be necessary. Wikipedia →
🧭 Start here: a 6-step reading path
- Read the overview: Multiple patterningA 5-minute orientation
- Skim a recent paper: Top-down fabrication of Si nanotube arrays using nanoimprint lithography and spacer patterning for electronic and optoelectronic applicationsInfluential work since 2022
- Pick up a classic book: Medicinal chemistry and drug designThe most-reprinted book on the subject
- Read the landmark paper: A spacer patterning technology for nanoscale CMOSCited 189 times
- Go sideways: EUV lithographyA closely related topic
- Go sideways: Spacer patterningA closely related topic
📖 Definitions
No dictionary entry for this exact phrase.
🗂️ The subject at a glance
- Situations requiring multiple patterning
- Line cutting
- Pitch splitting
- Sidewall image transfer
- Self-aligned contact/via patterning
- Spacer-is-dielectric (SID) SADP
- Self-aligned quadruple patterning (SAQP)
- Multi-Spacer Pitch Reduction
- Directed self-assembly (DSA)
- Other multi-patterning techniques
- EUV multiple patterning possibilities
- Multipatterning implementations
🏆 Landmark papers (most cited)
A spacer patterning technology for nanoscale CMOS
Spacer defined FinFET: Active area patterning of sub-20nm fins with high density
Obtaining nanoimprint template gratings with 10 nm half-pitch by atomic layer deposition enabled spacer double patterning
Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
Patterning of silicon nitride for CMOS gate spacer technology. III. Investigation of synchronously pulsed CH3F/O2/He plasmas
Independent Double-Gate Fin SONOS Flash Memory Fabricated With Sidewall Spacer Patterning
Patterning of silicon nitride for CMOS gate spacer technology. II. Impact of subsilicon surface carbon implantation on epitaxial regrowth
The multi-spacer patterning technique: a non-lithographic technique for terascale integration
🆕 Influential since 2022
Top-down fabrication of Si nanotube arrays using nanoimprint lithography and spacer patterning for electronic and optoelectronic applications
Geometry-Optimized Flexible Ferroelectret Fabricated by Laser Patterning of an Adhesive Spacer
Nitride spacer aided 0.15 μm AlGaN/GaN HEMT fabrication with optimized gate patterning process
Study of the Anti-Spacer Double Patterning Method
Sub-20-nm tip-to-tip enabled by anti-spacer patterning
📚 Books worth reading
Medicinal chemistry and drug designDeniz Ekinci · 2012
Ranked by number of editions on Open Library, a rough measure of how lasting a book is.
🔗 Related topics
- EUV lithography Extreme ultraviolet lithography (EUVL or simply EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It…
- Spacer patterning Spacer patterning is a technique employed for patterning features with linewidths smaller than can be achieved by conventional lithography. In the most…
- 7 nm process In semiconductor manufacturing, the "7 nm" process is a term for the MOSFET technology node following the "10 nm" node, defined by the International Roadmap…
- Photolithography Photolithography (also known as optical lithography) is a process that uses light to transfer a pattern onto a photoresist layer deposited on a sample…
- Photomask A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are…
- Optical proximity correction Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process…
- Phase-shift mask Phase-shift masks are photomasks that take advantage of the interference generated by phase differences to improve image resolution in photolithography…
- Electron-beam lithography Electron-beam lithography (often abbreviated as e-beam lithography or EBL) is the practice of scanning a focused beam of electrons to draw custom shapes…