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Everything about Multiple patterning
Technique used to increase the number of structures a microchip may contain
Multiple patterning is a class of technologies for manufacturing integrated circuits (ICs), developed for photolithography to enhance the feature density. It is expected to be necessary for the 10 nm and 7 nm node semiconductor processes and beyond. The premise is that a single lithographic exposure may not be enough to provide sufficient resolution. Hence additional exposures would be needed, or else positioning patterns using etched feature sidewalls would be necessary. Wikipedia →
🧭 Start here: a 6-step reading path
- Read the overview: Multiple patterningA 5-minute orientation
- Skim a recent paper: The technology of wearable flexible textile-based strain sensors for monitoring multiple human motions: construction, patterning and performanceInfluential work since 2022
- Pick up a classic book: Science through multiple intelligencesThe most-reprinted book on the subject
- Read the landmark paper: Spatially controlled simultaneous patterning of multiple growth factors in three-dimensional hydrogelsCited 460 times
- Go sideways: EUV lithographyA closely related topic
- Go sideways: Spacer patterningA closely related topic
📖 Definitions
No dictionary entry for this exact phrase.
🗂️ The subject at a glance
- Situations requiring multiple patterning
- Line cutting
- Pitch splitting
- Sidewall image transfer
- Self-aligned contact/via patterning
- Spacer-is-dielectric (SID) SADP
- Self-aligned quadruple patterning (SAQP)
- Multi-Spacer Pitch Reduction
- Directed self-assembly (DSA)
- Other multi-patterning techniques
- EUV multiple patterning possibilities
- Multipatterning implementations
🏆 Landmark papers (most cited)
Spatially controlled simultaneous patterning of multiple growth factors in three-dimensional hydrogels
Patterning Multiple Aligned Self-Assembled Monolayers Using Light
Multiple Roles for four-jointed in Planar Polarity and Limb Patterning
Multiple roles of mesenchymal β-catenin during murine limb patterning
Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures
Multiple Length Scale Patterning of Single-Molecule Magnets
Patterning multiple cell types in co-cultures: A review
Block copolymer multiple patterning integrated with conventional ArFlithography
🆕 Influential since 2022
The technology of wearable flexible textile-based strain sensors for monitoring multiple human motions: construction, patterning and performance
Photo‐Controllable Persistent Luminescence in Doped Polymers for Reversible High‐Resolution Patterning and Multiple Stimuli‐Response
Modeling convergent scale-by-scale skin color patterning in multiple species of lizards
Polarization-Sensitive Patterning of Azopolymer Thin Films Using Multiple Structured Laser Beams
Exploring the Spatial Patterning of Sociodemographic Disparities in Extreme Heat Exposure at Multiple Scales Across the Conterminous United States
📚 Books worth reading
Science through multiple intelligencesRobert Barkman · 1999- 📕Living with the PastVicky Crewe · 2012
Ranked by number of editions on Open Library, a rough measure of how lasting a book is.
🔗 Related topics
- EUV lithography Extreme ultraviolet lithography (EUVL or simply EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It…
- Spacer patterning Spacer patterning is a technique employed for patterning features with linewidths smaller than can be achieved by conventional lithography. In the most…
- 7 nm process In semiconductor manufacturing, the "7 nm" process is a term for the MOSFET technology node following the "10 nm" node, defined by the International Roadmap…
- Photolithography Photolithography (also known as optical lithography) is a process that uses light to transfer a pattern onto a photoresist layer deposited on a sample…
- Photomask A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are…
- Optical proximity correction Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process…
- Phase-shift mask Phase-shift masks are photomasks that take advantage of the interference generated by phase differences to improve image resolution in photolithography…
- Electron-beam lithography Electron-beam lithography (often abbreviated as e-beam lithography or EBL) is the practice of scanning a focused beam of electrons to draw custom shapes…