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Everything about Rapid thermal processing
Quickly heats semiconductor wafers to high temperatures
Rapid thermal processing (RTP) is a semiconductor manufacturing process which heats silicon wafers to temperatures exceeding 1,000°C for not more than a few seconds. During cooling wafer temperatures must be brought down slowly to prevent dislocations and wafer breakage due to thermal shock. Such rapid heating rates are often attained by high intensity lamps or lasers. These processes are used for a wide variety of applications in semiconductor manufacturing including dopant activation, thermal oxidation, metal reflow and chemical vapor deposition. Wikipedia →
🧭 Start here: a 6-step reading path
- Read the overview: Rapid thermal processingA 5-minute orientation
- Skim a recent paper: Detecting, characterising and assessing PEEK’s and CF-PEEK’s thermal degradation in rapid high-temperature processingInfluential work since 2022
- Pick up a classic book: Rapid Thermal ProcessingThe most-reprinted book on the subject
- Read the landmark paper: Rapid Thermal Processing to Enhance Steel ToughnessCited 52 times
- Go sideways: Furnace annealA closely related topic
- Go sideways: Ultra-high-purity steam for oxidation and annealingA closely related topic
📖 Definitions
No dictionary entry for this exact phrase.
🗂️ The subject at a glance
🏆 Landmark papers (most cited)
Rapid Thermal Processing to Enhance Steel Toughness
Platinum silicide formation using rapid thermal processing
Recent developments in rapid thermal processing
Rapid thermal processing in semiconductor technology
Rapid thermal processing of inorganic membranes
Rapid thermal processing of magnetic materials
Model-based control in rapid thermal processing
Rapid Thermal Annealing in GaAs IC Processing
🆕 Influential since 2022
Detecting, characterising and assessing PEEK’s and CF-PEEK’s thermal degradation in rapid high-temperature processing
Point-defect engineering of nanoporous CuBi2O4 photocathode via rapid thermal processing for enhanced photoelectrochemical activity
Rapid thermal processing of garnet-based composite cathodes
Novel method for preparation of high-performance SmFe12/α-Fe nanocomposite magnets by rapid thermal processing
Flexible and lightweight graphene grown by rapid thermal processing chemical vapor deposition for thermal management in consumer electronics
📚 Books worth reading
Rapid Thermal ProcessingRichard B. Fair · 1993
Advances in Rapid Thermal ProcessingRoozeboom F. · 1999
Rapid Thermal Processing for Future Semiconductor DevicesH. Fukuda · 2003
Annual publication of the Historical Society of Southern California and of the Pioneers of Los Angeles CountySyd R. Wilson, Ronald Powell · 1987- 📕Transient Thermal Processing Techniques in Electronic MaterialsMetals and Materials Society. Fall Meeting (1999 : Cincinnati, Ohio) Minerals · 1996
Rapid thermal and integrated processing VII · 1998
Rapid thermal and other short-time processing technologiesInternational Symposium on Rapid Thermal and Other Short-Time Processing Technologies (1st 2000 Toronto, Ont.), Ont.) International Symposium on Rapid Thermal and Other Short-Time Processing Technologies (1st : 2000 : Toronto · 2000
Rapid thermal annealing/chemical vapor deposition and integrated processingMartin L. Green, Jeffrey C. Gelpey · 1989
Ranked by number of editions on Open Library, a rough measure of how lasting a book is.
🔗 Related topics
- Furnace anneal Furnace annealing is a process used in semiconductor device fabrication which consist of heating multiple semiconductor wafers in order to affect their…
- Ultra-high-purity steam for oxidation and annealing Ultra-high-purity steam, also called the clean steam, UHP steam or high purity water vapor, is used in a variety of industrial manufacturing processes…
- Doping (semiconductor) In semiconductor production, doping is the intentional introduction of impurities into an intrinsic (undoped) semiconductor for the purpose of modulating…
- Ion implantation Ion implantation is a low-temperature process by which ions of one element are accelerated into a solid target, thereby changing the target's physical…
- Monolayer doping Monolayer doping (MLD) in semiconductor production is a well controlled, wafer-scale surface doping technique first developed at the University of California…
- Epitaxy Epitaxy (prefix epi- means "on top of") is a type of crystal growth or material deposition in which new crystalline layers are formed with one or more…
- Dopant activation Dopant activation is the process of obtaining the desired electronic contribution from impurity species in a semiconductor host. The term is often restricted…
- Metal gate A metal gate, in the context of a lateral metal–oxide–semiconductor (MOS) stack, is the gate electrode separated by an oxide from the transistor's channel…